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Oxygen '96

Early Stages of Oxygen Precipitation in Silicon


26th - 29th March 1996
NATO Advanced Research Workshop

Co-sponsored by the University of Exeter


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Preliminary List of Participants

Key Speakers:

C. A. J. Ammerlaan University of Amsterdam, The Netherlands
J. Chadi NEC Research Ltd., Princetown, USA
G. Davies King's College, London
P. Deák Technical University of Budapest, Hungary
S. K. Estreicher Texas Tech University, Lubbock, Texas
C. P. Ewels University of Exeter, UK
U. Gösele Max Planck Institute for Microstructural Physics, Germany
E. Lightowlers King's College, London
J. L. Lindström Linköping University, Sweden
V. P. Markevich Academy of Sciences of the Belarus', Minsk, Belarus'
R. C. Newman IRC, University of London, UK
B. Pajot University of Paris, France
M. Ramamoorthy Vanderbilt University, Nashville, USA
J. M. Spaeth University of Paderborn, Germany
M. Stavola Lehigh University, Bethlehem, USA
M. Suezawa Tohoku University, Sendai, Japan
K. Sumino Tohoku University, Sendai, Japan
G. D. Watkins Lehigh University, Bethlehem, USA
E. R. Weber University of California, Berkeley, USA
J. Weber Max Planck Institute for Solid State Physics, Germany

Delegates:

D. Ballutaud CNRS / Laboratoire de Physique des Solides de Bellevue, France
B. Bech Nielsen University of Aarhus, Denmark
F. Berg Rasmussen University of Amsterdam, The Netherlands
J. Binns MEMC Electronic Materials Inc., Missouri, USA
K. Bonde-Nielsen University of Aarhus, Denmark
H. Cox University of Sussex, UK
B. Eggen University of Sussex, UK
V. Emtsev A. F. Ioffe Physicotechnical Institute, St Petersburg, Russia
R. Falster MEMC Electronic Materials SpA, Novara, Italy
M. Fujinami Nippon Steel Corporation, Nakahara-ku, Japan
A. Gali Technical University of Budapest, Hungary
N. Gay Laboratoir de Photoelectricite des Semi-Conducteurs,Marseilles, France
T. Gasche Universidade de Aveiro, Portugal
J. Goss University of Exeter, UK
J. E. Gower Kings College London, UK
P. Grönberg Helsinki University of Technology, Finland
T. Hallberg Linköping University, Sweden
H. Harada Nippon Steel Co., Futtsu City, Japan
M. I. Heggie University of Sussex, UK
M. Henry Dublin City University, Ireland
V. Higgs Bio-Rad Microscience Ltd, Hemel Hempstead, UK
N. Itoh Osaka Institute of Technology, Japan
R. Jones University of Exeter, UK
K. Kawakami Nippon Steel Co., Shimata, Japan.
K. Kelton Washington University, St. Louis, Missouri, USA
L. Khirunenko National Academy of Sciences of Ukraine
A. Knights University of Western Ontario, Canada
S. Korenev Joint Institute for Nuclear Research, Dubna, Russia
C. D. Latham University of Exeter, UK
P. Leary University of Exeter, UK
R. Lichti Daresbury Laboratory, UK
C. A. Londos University of Athens, Greece
A. Mainwood King's College London, UK
S. McQuaid Departamento Ingenieria Electronica, Madrid, Spain
J. Miro Technical University of Budapest, Hungary
A. Misiuk Institute of Electron Technology, Warsaw, Poland
M. Momirlan Institute of Physical Chemistry, Bucharest, Romania
B. Mukashev Physical Technical Insitute of NAS, Almaty, Kazakstan
L. Murin Institute of Solid State and Semiconductor Physics, Minsk, Belarus
R. Nieminen Helsinki University of Technology, Finland
S. Öberg University of Luleá, Sweden
H. Ono Microelectronics Research Laboratories, Tsukuba, Japan
M. Rosenbauer Universite Paris 6 et 7, France
A. Safanov Kings College London, UK
S. Senkader Institüt für Festkorperelektronik, Vienna, Austria
V. Shakhovtsov National Academy of Sciences of Ukraine
L. Snyder Dept Chemistry, Albany, New York, USA
G. P. Srivastava Department of Physics, University of Exeter, UK
R. Stewart J. J. Thomson Physical Laboratory, Reading, UK
A. M. Stoneham University College London, UK
T. Tkacheva Russian Academy of Sciences, Moscow, Russia
V. Torres Universidade de Aveiro, Portugal
A. Ulyashin Belorussian State Polytechnical Academy, Belarus
J. Vanhellemont IMEC, Leuven, Belgium
C. Veve Laboratoir de Photoelectricite des Semi-Conducteurs, Marseilles, France
W. von Ammon Wacker Siltronic, Burghausen, Germany
J. von Boehm Helsinki University of Technology, Finland
H. Yamada-Kaneta Fujitsu Ltd., Nakahara-ku, Japan
C. Yamada-Kaneta Fujitsu Ltd., Nakahara-ku, Japan
V. Yashnik National Academy of Sciences of Ukraine


Full list of abstracts | main page.
Last modified: Fri Jul 5 09:30:21 BST 1996 JG
                                                                                                                                                                                                                                                                       

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