Back to top
Oxygen '96
Early Stages of Oxygen Precipitation in Silicon
Preliminary List of Participants
Key Speakers:
C. A. J. Ammerlaan |
University of Amsterdam, The Netherlands |
J. Chadi |
NEC Research Ltd., Princetown, USA |
G. Davies |
King's College, London |
P. Deák |
Technical University of Budapest, Hungary |
S. K. Estreicher |
Texas Tech University, Lubbock, Texas |
C. P. Ewels |
University of Exeter, UK |
U. Gösele |
Max Planck Institute for Microstructural Physics, Germany |
E. Lightowlers |
King's College, London |
J. L. Lindström |
Linköping University, Sweden |
V. P. Markevich |
Academy of Sciences of the Belarus', Minsk, Belarus' |
R. C. Newman |
IRC, University of London, UK |
B. Pajot |
University of Paris, France |
M. Ramamoorthy |
Vanderbilt University, Nashville, USA |
J. M. Spaeth |
University of Paderborn, Germany |
M. Stavola |
Lehigh University, Bethlehem, USA |
M. Suezawa |
Tohoku University, Sendai, Japan |
K. Sumino |
Tohoku University, Sendai, Japan |
G. D. Watkins |
Lehigh University, Bethlehem, USA |
E. R. Weber |
University of California, Berkeley, USA |
J. Weber |
Max Planck Institute for Solid State Physics, Germany |
Delegates:
D. Ballutaud |
CNRS / Laboratoire de Physique des Solides de Bellevue,
France |
B. Bech Nielsen |
University of Aarhus, Denmark |
F. Berg Rasmussen |
University of Amsterdam, The Netherlands |
J. Binns |
MEMC Electronic Materials Inc., Missouri, USA |
K. Bonde-Nielsen |
University of Aarhus, Denmark |
H. Cox |
University of Sussex, UK |
B. Eggen |
University of Sussex, UK |
V. Emtsev |
A. F. Ioffe Physicotechnical Institute, St Petersburg, Russia
|
R. Falster |
MEMC Electronic Materials SpA, Novara, Italy |
M. Fujinami |
Nippon Steel Corporation, Nakahara-ku, Japan |
A. Gali |
Technical University of Budapest, Hungary |
N. Gay |
Laboratoir de Photoelectricite des
Semi-Conducteurs,Marseilles, France |
T. Gasche |
Universidade de Aveiro, Portugal |
J. Goss |
University of Exeter, UK |
J. E. Gower |
Kings College London, UK |
P. Grönberg |
Helsinki University of Technology, Finland |
T. Hallberg |
Linköping University, Sweden |
H. Harada |
Nippon Steel Co., Futtsu City, Japan |
M. I. Heggie |
University of Sussex, UK |
M. Henry |
Dublin City University, Ireland |
V. Higgs |
Bio-Rad Microscience Ltd, Hemel Hempstead, UK |
N. Itoh |
Osaka Institute of Technology, Japan |
R. Jones |
University of Exeter, UK |
K. Kawakami |
Nippon Steel Co., Shimata, Japan. |
K. Kelton |
Washington University, St. Louis, Missouri, USA |
L. Khirunenko |
National Academy of Sciences of Ukraine |
A. Knights |
University of Western Ontario, Canada |
S. Korenev |
Joint Institute for Nuclear Research, Dubna, Russia |
C. D. Latham |
University of Exeter, UK |
P. Leary |
University of Exeter, UK |
R. Lichti |
Daresbury Laboratory, UK |
C. A. Londos |
University of Athens, Greece |
A. Mainwood |
King's College London, UK |
S. McQuaid |
Departamento Ingenieria Electronica, Madrid, Spain |
J. Miro |
Technical University of Budapest, Hungary |
A. Misiuk |
Institute of Electron Technology, Warsaw, Poland |
M. Momirlan |
Institute of Physical Chemistry, Bucharest, Romania |
B. Mukashev |
Physical Technical Insitute of NAS, Almaty, Kazakstan |
L. Murin |
Institute of Solid State and Semiconductor Physics, Minsk,
Belarus |
R. Nieminen |
Helsinki University of Technology, Finland |
S. Öberg |
University of Luleá, Sweden |
H. Ono |
Microelectronics Research Laboratories, Tsukuba, Japan |
M. Rosenbauer |
Universite Paris 6 et 7, France |
A. Safanov |
Kings College London, UK |
S. Senkader |
Institüt für Festkorperelektronik, Vienna, Austria
|
V. Shakhovtsov |
National Academy of Sciences of Ukraine |
L. Snyder |
Dept Chemistry, Albany, New York, USA |
G. P. Srivastava |
Department of Physics, University of Exeter, UK |
R. Stewart |
J. J. Thomson Physical Laboratory, Reading, UK |
A. M. Stoneham |
University College London, UK |
T. Tkacheva |
Russian Academy of Sciences, Moscow, Russia |
V. Torres |
Universidade de Aveiro, Portugal |
A. Ulyashin |
Belorussian State Polytechnical Academy, Belarus |
J. Vanhellemont |
IMEC, Leuven, Belgium |
C. Veve |
Laboratoir de Photoelectricite des Semi-Conducteurs,
Marseilles, France |
W. von Ammon |
Wacker Siltronic, Burghausen, Germany |
J. von Boehm |
Helsinki University of Technology, Finland |
H. Yamada-Kaneta |
Fujitsu Ltd., Nakahara-ku, Japan |
C. Yamada-Kaneta |
Fujitsu Ltd., Nakahara-ku, Japan |
V. Yashnik |
National Academy of Sciences of Ukraine |
Full list of abstracts | main page.
Last modified: Fri Jul 5 09:30:21 BST 1996
JG
|