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Overview
Facilities
Ultrafast laser
Ultra high
vacuum
sputtering
X-Rays
AGM
Magnetometry
MOKE
Magnetometry
Magnetotransport
People
Vacancies
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Our ultra high vacuum (UHV) sputtering system has four magnetron
sources that accept 2 inch diameter targets. The system may be baked
to 200 ¡C during which time the pole pieces are removed from the guns.
DC and RF power supplies are used to sputter both metals and
insulators. Each gun has a separate crystal oscillator and the
shutter plate and substrate platters are driven by computer controlled
stepper motors. A further in-situ stepper motor is used to drive a
shadow mask carousel, and a glow discharge is used to oxidise metal
films in a controlled manner. The system can be used to fabricate an
enormous variety of materials including multilayers, spin-valves,
tunnel junctions, amorphous alloys and granular materials.
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