Room Temperature Electroluminescence in Si: 
 Rare-Earth Impurities
There has been an enormous amount of work trying to obtain an intense luminescence signal from Si and the recent observations of room temperature photoluminescence (PL) [1, 2] and, even more remarkably, room temperature electroluminescence in Si:Er [3] have created great interest in the materials science community.
The   intra-4f electronic  transitions in  rare-earth  (RE) impurities
involve very  localised   atomic  orbitals and  their   absorption and
luminescent   bands  are extremely  sharp  and   characterised by long
lifetimes   even     in disordered     environments  such   as glasses
[4, 5].  Er has been  a favoured dopant  in Si since its
emission wavelength is a minimum for both absorption and dispersion in
fibre-optic cables.   The work on Si  is particularly important as the
mature processing  technology can be  utilised  in the  development of
optical   communication  devices.     The    
 I 
 I transition (   
  1.54  
 m) is dipole forbidden
in the atom  but  is allowed through  wave-function overlap  with  the
ligands. The MIT and AT&T groups have shown that co-doping with O, or
other light elements, increases the PL  intensity by factors up to 80:
there    is only weak      PL in float    zone  Si  implanted  with Er
[6].    It is   the understanding  of this  remarkable
increase of the  PL intensity with co-doping that  is the main aim  of
this project.  Although experimental work is well advanced, there has
been very  little theoretical work into  this effect or even  into the
theory of RE impurities in semiconductors.
There is then a timely need to explore theoretically the effects due to the environment, especially in regard to gap levels, the covalent and crystal field contributions to the f-level splitting as well as the intra-f dipole matrix elements. These are the principal aims of the project.
A current technical  problem is the low  power output arising from the
long radiative life-time and the low concentration of optically active
Er defects. One way of getting around the  former may be by implanting
REs in nano-crystalline Si which  in principle could  lead to a
large increase in power. For example, Mn in nano-crystalline ZnS has a
radiative   life-time    10 
   times    that of  Mn    in bulk   ZnS
[7].  This effect  is probably  due to   a confinement  of the
exciton to  the  nano-crystal.  These  ideas will  be explored  in the
proposal.
The environment of the rare-earth (RE) impurity in the lattice for four effects. Firstly, in the introduction of gap levels without which the the first stage of the PL, namely the trapping of an e-h pair would be inefficient. However, evidence for RE induced gap levels is scanty. DLTS studies of Si:Er suggest some [8] although no such levels are seen when MBE grown material was used [9] duue to segregation of the RE [10, 11]. Gap levels are found in DLTS studies of InP:Yb [12]. Secondly, a crystal field or more likely, covalent bonding [13] with the RE's neighbours, split the f-levels leading to terms of odd parity in the potential and hence to non-zero dipole elements permitting the optical transition. Thirdly, a strong RE-neighbour interaction leads to low diffusivity of the RE and the inhibition in the growth of a metallic phase. Finally, O can cause RE ions to switch sites from interstitial to substitutional possibly leading to optical activity.
Information, however, on the lattice location and neighbours of the RE
is  notoriously difficult to find.   EXAFS has given  some details for
glasses [14, 15, 16] and  there has  very recently been
some  RBS data [17]  in the  compound semiconductors.  The
conclusion is that, except  for Yb in  InP, RE ions in III-V materials
and  Er in  Si [18]  do not  occupy   lattice sites.  Two
problems are,  however, that the  optically active fraction  of the RE
defect might occupy  a site distinct from  the major inactive  species
and that co-doping causes site switching. Takahei et al [19]
concluded from channelling and SIMS studies on O-doped GaAs:Er that Er
was located  at a Ga site  with two O atoms  at neighbouring As sites.
Thus  the  RBS data  indicates  that O drives   Er  on-site.  Other PL
studies [20]  conclude that  Er is  at a  
   interstitial
site in FZ-Si but in Cz-Si, Er defects with lower symmetry are found.
Given the extreme difficulty of determining the active sites of the rare earth impurity, there has been interest in applying ab initio modelling techniques.